Numerical Simulation of a New SiC Growth System by the Dual-Directional Sublimation Method

Xuejiang Chen,Shin-ichi Nishizawa,Koichi Kakimoto
DOI: https://doi.org/10.1016/j.jcrysgro.2010.02.027
IF: 1.8
2010-01-01
Journal of Crystal Growth
Abstract:A new SiC growth system using the dual-directional sublimation method was investigated in this study. Induction heating and thermal conditions were computed and analyzed by using a global simulation model, and then the values of growth rate and shear stress in a growing crystal were calculated and compared with those in a conventional system. The results showed that the growth rate of SiC single crystals can be increased by twofold by using the dual-directional sublimation method with little increase in electrical power consumption and that thermal stresses can be reduced due to no constraint of the crucible lid and low temperature gradient in crystals.
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