In Situ Photoluminescence Studies of Silicon Surfaces During Photoelectrochemical Etching Processes

FM Liu,B Ren,JW Yan,BW Mao,ZQ Tian
DOI: https://doi.org/10.1016/s0218-625x(01)00112-9
2001-01-01
Surface Review and Letters
Abstract:The photoluminescence (PL) from silicon surfaces during photoelectrochemical etching processes was monitored in situ by using a confocal microprobe spectrometer. The etching time, laser power, polarization potential and the resistance of silicon were found to remarkably influence the formation of porous silicon (PS). For the high resistance silicon sample, the PL band intially increases in intensity and blueshifts with the progress of etching, then decreases and stops shifting. The higher the laser power is, the stronger the PL intensity and the shorter the wavelength could be. For the low resistance silicon sample, no clear shift in the wavelength could be found with the progress of etching. These results were interpreted by the quantum confinement effect together with the influence of electrochemical reaction equilibrium and the surface oxidation species on the formation of PS.
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