Transition of Tin Iodide Thin Films from Equilibrium to Non-Equilibrium Growth

F Yang,JZ Zhang,F Pan
DOI: https://doi.org/10.1002/1521-396x(200112)188:3<1013::aid-pssa1013>3.3.co;2-3
2001-01-01
physica status solidi (a)
Abstract:The morphology of vapor-deposited SnI2 on silicon substrate was studied by scanning electron microscopy. Crystallization and fractal aggregation were observed simultaneously on the same sample. Computer simulation was used to investigate the growth process of the SnI2 patterns. The simulation model included common crystal formation and deposition-diffusion-aggregation (DDA) fractal growth. Simulation results resembled the morphology and fractal dimension of the experimental results. They also showed that local temperature variations of the silicon substrate determined the aggregation mode of the deposited SnI2 particles and that the growth mechanism was controlled by the free energy transformation in the system.
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