EMISSION MODEL IN HOLE-NET STRUCTURE ON SILICON CRYSTAL BY IRRADIATION OF LASER

JIN Feng,WANG Hai-xu,HUANG Wei-qi,WU Ke-yue,LIU Shi-zhong,XU Li,QIN Cao-jian
DOI: https://doi.org/10.3969/j.issn.1000-5269.2007.02.010
2007-01-01
Abstract:We propose a model to explain the increasing PL emission in a kind of hole-net structure on silicon crystal irradiated with laser of 50W and 1064nm,in which the trap states of the interface between SiO2 and nanocrystal play an important role.The center of the PL spectrum is about 700nm.It is identified through experiments that the oxide on the sample may be the most important fact in the enhancing effect of the PL emission.The optimum conditions in preparing the sample with an enhanced emission can be obtained.
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