MOS controlled current interruption

Qin Huang,Gehan A.J. Amaratunga,William I. Milne
DOI: https://doi.org/10.1016/0038-1101(92)90059-l
1992-01-01
Abstract:Two-dimensional transient simulation has been carried out on a MOS controlled p+nn+ diode under high injection. It has been verified through simulation that the discharging of the MOS gate causes current interruption inside the diode, and that plasma depletion can happen only after the removal of the plasma layer via the discharging current. This result is important to the understanding of the turn-off mechanism in MOS controlled thyristor structures such as the depletion mode thyristor (DMT).
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