Manufacturing of Fine Lines by Semi-additive Process with Electroplating

CHEN Yuan-ming,HE Wei,HUANG Zhi-yuan,HUANG Tong-bin,WANG Wei,ZHU Meng,WANG Ze-yu
DOI: https://doi.org/10.3969/j.issn.1001-3849.2012.07.002
2012-01-01
Abstract:Semi-additive process with electroplating was used in this text for the manufacturing of fine lines.The effects of HCl-CuCl2 or H2SO4-H2O2 etching system,thickness of copper foils and direct or pulse current electroplating on the etching qualities of fine lines were studied and compared.Results showed fine lines with uniform plating thickness,fine etching effect and high flexural performance could be prepared by semi-additive process with electroplating under H2SO4-H2O2 etching system,thin copper foils and pulse electroplating.And the fine lines by semi-additive process with electroplating still had a good quality when the line width and line distance were decreased to 30 μm.So this semi-additive process with electroplating was suitable to the manufacturing of fine lines in multilayer printed circuit board,flexible printed circuit and rigid-flexible printed circuit.
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