Effective Crosstalk Isolation With Post-CMOS Selectively Grown Porous Silicon Technique for Radio Frequency System-on-Chip (SOC) Applications

Chen Li,Huailin Liao,Chuan Wang,Ru Huang,Yangyuan Wang
DOI: https://doi.org/10.1109/LED.2008.2001479
IF: 4.8157
2008-01-01
IEEE Electron Device Letters
Abstract:In this letter, post-CMOS substrate selective-transformation engineering based on the selectively grown porous silicon (SGPS) technique is demonstrated to effectively suppress substrate crosstalk. The testing structures for crosstalk isolation are fabricated in a standard 0.18-mum CMOS process, and porous silicon trenches are selectively grown after processing from the backside of the silicon wafe...
What problem does this paper attempt to address?