Polarization-selective subwavelength grating used with 193nm light

Guo Guo Kang,Qiao Feng Tan,Guo Fan Jin
DOI: https://doi.org/10.1016/j.optcom.2010.04.073
IF: 2.4
2010-01-01
Optics Communications
Abstract:Hyper-NA ArF (193nm) immersion lithography is one of the most potential technologies to achieve 32nm critical dimension node. At the corresponding large angles in the photoresist, control of polarization becomes necessary. A polarization beam splitter (PBS) based on a subwavelength dielectric grating has been designed for use with 193nm light. The polarization-selective property of such grating is explained by the mechanism of mode interference. The designed grating working as a 1×2 beam splitter can transmit TM wave (∼90%) to the zeroth order with extinction ratio of 753, and it diffracts TE wave (∼80%) to the −1st order with extinction ratio of 300.
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