Abstract:Digital light processing (DLP)-based printing system equipped with ultraviolet (UV) source has been used to fabricate user-defined complex structures for biomedical applications. For printing large-scale structure, improving the structural consistency remains a challenge owing to the non-uniformly distributed UV light. Here, we present a multi-step exposure (MSE) method that takes advantage of a series of gradient digital masks to compensate the under-cured regions with additional UV exposure and eventually improve the surface flatness. First, for the established DLP-based printing system, the distribution of the UV power density is me asured and the relationship between the UV power density, exposure time and printing thickness are studied. The structure thickness can be calculated by the distribution of UV power density and exposure time. Then, the MSE method is proposed and an algorithm is customized to automatically modify the original mask into a series of gradient masks for MSE printing. Experimental validation was carried out by evaluating the morphologies of stripes printed without and with MSE. Printing of helix microfluidic chips revealed that the consistency of the channel thickness can be ensured by employing the MSE method. Thus, this MSE method for DLP-based printing is promising for printing large-scale structures with a consistent thickness and high resolution.

Improving the imaging quality of MOEs in DMD-based maskless lithography

Rapid Fabrication of Micro Optical Elements Using DMD-Based Maskless Lithography Technique

Algorithm Optimization and Mask Data Generating for Dammann Gratings in Laser Medical Applications

Genetic Algorithm-Based Optical Proximity Correction for DMD Maskless Lithography.

DMD maskless lithography optimization based on an improved genetic algorithm

Simulation of Doe Fabrication Using Dmd-Based Gray-Tone Lithography

Multi-step exposure method for improving structure flatness in digital light processing-based printing

Imaging simulation of maskless lithography using a DMD™

Microscopic Lithography with Pixelate Diffraction of A Digital Micro-Mirror Device for Micro-Lens Fabrication

Research On A New Approach For The Fabrication Of Diffractive Optical Elements By Means Of Rotating Digital Mask

Improvement of Three-Dimensional Microstructure Contour Accuracy Using Maskless Lithography Technique Based on Dmd

DMD-based Gray-tone Lithography for Fabrication of Continuous Profile Microstructure

Gradient-Based Source And Mask Optimization In Optical Lithography

Optical proximity correction of hot-spot patterns with subwavelength size in DMD maskless projection lithography

Maskless Microscopic Lithography Through Shaping Ultraviolet Laser with Digital Micro-mirror Device

Enhanced corner sharpness in DMD-based scanning maskless lithography using optical proximity correction and genetic algorithm

Improving the Edge Profiles of Lithography Patterns Using Gray-Tone Technique in Digital Photolithography

Grayscale Expanding For System Of Digital Mask Fabrication

Source and Mask Co-Optimization Using A Gradient Based Method in Optical Lithography

Optimization of partial photo mask based on wave-front division theory in proximity lithography

Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique