Abstract:<p>Photolithography is one of the most commonly used techniques in semiconductor manufacturing, which is the foundation for all the modern electronic device fabrication. However, deep and extreme ultraviolet lithographic systems as well as the corresponding photomasks are both relatively expensive. The fabrication methods are based on the low‐speed high‐cost electron‐beam lithography or focused‐ion‐beam etching. Therefore, a maskless high‐speed method is highly recommended for the micro/nano‐structure fabrication. Among all these maskless methods, direct laser writing (DLW) is an important and widely adopted micro‐processing technique. Based on the nonlinear exposure, the feature size can achieve down to tens of nanometers. However, the speed of DLW is a technical bottleneck. To overcome this issue, parallel DLW methods are developed, including the self‐assembly microspheres laser patterning, laser interference lithography, and multifocal array DLW. Herein, the principles, advantages, challenges, and applications of these parallel processing technologies are summarized. Nanoscale resolution for large area arbitrary periodic pattern fabrication is achieved. Meanwhile, these technologies have the unique ability to build 3D structures instead of conventional 2D patterns, which is the direction of future micro/nano‐fabrication. These techniques are widely applied to surface processing and functional device fabrication in the field of sensing, solar cells, and metamaterials.</p>

Rapid Fabrication of Micro Optical Elements Using DMD-Based Maskless Lithography Technique

DMD-based compact SIM system with hexagonal-lattice-structured illumination

Improving the imaging quality of MOEs in DMD-based maskless lithography

Simulation of Doe Fabrication Using Dmd-Based Gray-Tone Lithography

Microscopic Lithography with Pixelate Diffraction of A Digital Micro-Mirror Device for Micro-Lens Fabrication

Research On A New Approach For The Fabrication Of Diffractive Optical Elements By Means Of Rotating Digital Mask

Imaging simulation of maskless lithography using a DMD™

DMD-based Gray-tone Lithography for Fabrication of Continuous Profile Microstructure

Maskless Microscopic Lithography Through Shaping Ultraviolet Laser with Digital Micro-mirror Device

Direct write of microlens array using digital projection photopolymerization

Rapid Prototyping of Organ-on-a-Chip Devices Using Maskless Photolithography

Fast Fabrication of Large-Area Two-Dimensional Micro/Nanostructure by Femtosecond Laser

Efficient Manufacturing of Microdome Array for Advanced Electronic and Optical Devices†

Precise Fabrication of Large-Area Microstructures by Digital Oblique Scanning Lithography Strategy and Stage Self-Calibration Technique

Fabrication of Microlens Array with Well-Defined Shape by Spatially Constrained Thermal Reflow

Projection Micro-Stereolithography Using Digital Micro-Mirror Dynamic Mask

Digital micromirror devices: principles and applications in imaging

A Low-Cost Fabrication System for Manufacturing Soft-Lithography Microfluidic Master Molds

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

A Microlens Array with Different Focal Lengths Fabricated by Roll-To-Roll UV Lithography

Microscope Projection Photolithography Based on Liquid Crystal Microdisplay