Cu/HZSM-5 Sorbent Treated by NH 3 Plasma for Low-Temperature Simultaneous Adsorption–Oxidation of H 2 S and PH 3

Jiayu Feng,Fei Wang,Chi Wang,Kai Li,Xin Sun,Ping Ning

DOI: https://doi.org/10.1021/acsami.1c02584

2021-05-21

Abstract:In this study, an NH₃ plasma-treated Cu/HZSM-5 sorbent was introduced to simultaneously remove H₂S and PH₃ in low-temperature and low-oxygen environments. The effects of the Cu loading amounts, modification methods, and plasma-treatment conditions on the adsorption–oxidation performance of the sorbents were investigated. From the performance test results, the sorbent treated by NH₃ plasma with the specific energy input (SEI, electrical input energy to the unit volume of gas) value of 1 J·mL^–1 (Cu/HZSM-5-[S1]) was identified as having the highest breakthrough capacities of 108.9 mg S·g^–1 and 150.9 mg P·g^–1 among all of the materials tested. After three times of regeneration, the sorbent can still maintain the ideal performance. The results of Fourier transform infrared (FT-IR) spectroscopy and CO₂ temperature-programmed desorption (CO₂-TPD) indicated that the NH₃ plasma treatment can introduce amino groups (functional groups) onto the sorbent surface, which greatly increases the number and strength of the basic sites on the sorbent surface. Results of N₂ adsorption/desorption isotherms and scanning electron microscopy–energy dispersive spectroscopy (SEM–EDS) showed that the morphology of the sorbent changed after the plasma treatment, which exposed more active sites (copper species). In situ IR spectra showed that the amino groups are continuously consumed during the reaction process, indicating that these amino groups can help sorbents to capture gas molecules. Moreover, X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) analyses indicated that CuO is the main active species and the consumption of CuO and accumulation of the reaction products on the surface and inner pores of the sorbent are the primary reasons for the deactivation of the sorbent.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acsami.1c02584?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acsami.1c02584</a>.Characterization methods (Appendix S1); effect of different Cu contents on the simultaneous removal of H₂S and PH₃ (Figure S1); discharge characteristics (Figure S2); N₂ adsorption/desorption isotherms (Figures S3 and S4a); XRD patterns (Figures S4b and S5); wide-survey XPS spectra (Figure S6); sequential in situ IR spectra (Figure S7); physical properties (Tables S1 and S2); and XPS data (Table S3) (<a class="ext-link" href="/doi/suppl/10.1021/acsami.1c02584/suppl_file/am1c02584_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.

materials science, multidisciplinary,nanoscience & nanotechnology