Abstract:Lithium niobate (LN) is used in diverse applications such as spectroscopy, remote sensing, and quantum communications. The emergence of lithium-niobate-on-insulator (LNOI) technology and its commercial accessibility represent significant milestones. This technology aids in harnessing the full potential of LN's properties, such as achieving tight mode confinement and strong overlap with applied electric fields, which has enabled LNOI-based electro-optic modulators to have ultra-broad bandwidths with low-voltage operation and low power consumption. Consequently, LNOI devices are emerging as competitive contenders in the integrated photonics landscape. However, the nanofabrication, particularly LN etching, presents a notable challenge. LN is hard, dense, and chemically inert. It has anisotropic etch behavior and a propensity to produce material redeposition during the reactive-ion plasma etch process. These factors make fabricating low-loss LNOI waveguides (WGs) challenging. Recognizing the pivotal role of addressing these fabrication challenges for obtaining low-loss WGs, our research focuses on a systematic study of various process steps in fabricating LNOI WGs and other photonic structures. In particular, our study involves (i) careful selection of hard mask materials, (ii) optimization of inductively coupled plasma etch parameters, and finally, (iii) determining the optimal post-etch cleaning approach to remove redeposited material on the sidewalls of the etched photonic structures. Using the recipe established, we realized optical WGs with total (propagation and coupling) loss value of -10.5 dB, comparable to established values found in the literature. Our findings broaden our understanding of optimizing fabrication processes for low-loss lithium-niobate waveguides and can serve as an accessible resource in advancing LNOI technology.

Low-Loss Waveguide Fabrication by Inkjet Printing on Porous Silicon

Low Propagation Loss Ge-on-Si Waveguides and Their Dependency on Processing Methods

Low loss hollow-core waveguide on a silicon substrate

Fabrication of silicon-on-glass waveguides

Fabrication Techniques For Polymer/Si Optical Waveguide

Fabrication and Characterization of Silicon Photonic Waveguides and Devices Via Selective Oxidation Process

Low-loss optofluidic waveguides in fused silica enabled by spatially shaped femtosecond laser assisted etching combined with carbon dioxide laser irradiation

Fabrication Of Composite Sol-Gel Optical Channel Waveguides By Laser Writing Lithography

Ultralow-loss tightly confining Si3N4 waveguides and high-Q microresonators

Ultralow-loss Waveguide Crossing for Photonic Integrated Circuits by Using Inverted Tapers

Dual-layer thick LPCVD SiN waveguides for low-loss photonics on 200 mm wafers

Fabrication of Polymer Optical Waveguides by Digital Ultraviolet Lithography

Femtosecond laser micromachining of waveguides in silicone-based hydrogel polymers

Single-step fabrication of surface waveguides in fused silica with few-cycle laser pulses

Effectively Writing Low Propagation and Bend Loss Waveguides in the Silica Glass by Using a Femtosecond Laser.

Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale

Direct laser written polymer waveguides with out of plane couplers for optical chips

Transverse Inscription of Silicon Waveguides by Picosecond Laser Pulses

Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform

Low Bend Loss, High Index, Composite Morphology Ultra-fast Laser Written Waveguides for Photonic Integrated Circuits

Suspended silicon waveguides for long-wave infrared wavelengths