Microstructure evolution, growth kinetics and formation mechanisms of silicon-rich NbSi 2 coatings on Nb substrate

Yingyi Zhang,Tao Fu,Junjie Zhu,Xu Zhang

DOI: https://doi.org/10.1016/j.jmrt.2023.04.222

IF: 6.267

2023-05-06

Journal of Materials Research and Technology

Abstract:A Si-rich NbSi 2 coating was prepared on Nb substrate by hot dip silicon plating process, which mainly consists of Nb 5 Si 3 interfacial layer, NbSi 2 intermediate layer and silicon-rich NbSi 2 outer layer. The Si-rich NbSi 2 coating has flat surface and dense structure, and the surface roughness is only 0.218–0.548 μm. Raising the deposition temperature can also significantly increase the growth rate of the Si-rich NbSi 2 coating. The hot-dip silicon plating process has an extremely low reaction activation energy (249.99 kJ mol −1 ), which indicates that there are a large number of activated molecules during hot dip silicon plating. The silicon atoms in the molten bath deposited on the Nb surface and maintained a high chemical potential gradient continuously. Therefore, the solid diffusion reaction of Nb–Si was continuous, and the Nb 5 Si 3 phase was generated and consumed continuously, and transformed into NbSi 2 phase, which led to a higher growth rate of coating (1.7 × 10 −13 to 4.3 × 10 −13 m 2 s).

materials science, multidisciplinary,metallurgy & metallurgical engineering