Abstract:High-aspect ratio x-ray absorption gratings are required for hard x-ray or high-resolution soft x-ray phasecontrast imaging (XPCi) applications. X-ray gratings play a central role in grating-based XPCi techniques, where visibility – image quality – is highly dependent on the quality of gratings. Although the fabrication process of x-ray gratings for soft x-ray imaging is well-developed, there are technological challenges in highresolution hard x-ray imaging that impede us from making high-aspect ratio large field-of-view fine x-ray gratings through conventional fabrication processes. Here we present a design and a fabrication process to fabricate highaspect ratio gratings that benefit from a self-aligned hard-mask – a patterned chromium-gold-chromium thin film deposited on a transparent ITO-on-glass substrate – which facilitates both lithography and electroplating processes. The repeatability of the proposed method makes it suitable for achieving high-aspect ratio fine structures as thick as desired through a multi-layer structure without any restraint or limitation on the aspect ratio of features. The multi-layer structure design overcomes the aspect ratio limitation associated with UVlithography. Although this method works well with X-ray lithography, the key advantage of this design is that it enables UV lithography for high-aspect ratio grating fabrication through a reliable yet simple process. To the best of our knowledge, self-aligned multi-layer SU-8 based grating design has not been previously reported. The proposed design and fabrication process help researchers further develop x-ray gratings performance to facilitate high-resolution coded-aperture and Talbot-Lau high-energy x-ray phase-contrast imaging.

Bottom-up Gold Filling of Trenches in Curved Wafers

(Invited) Bottom-up Gold Filling for Manufacture of X-Ray Gratings: Mechanism and Implications

Bottom-up Gold Filling for Manufacture of X-Ray Gratings: To What Limit?

In Situ Observation of High Bending Strain Recoverability in Au Nanowires

Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

Hot embossing of Au- and Pb- based alloys for X ray grating fabrication

High‐Aspect‐Ratio Grating Microfabrication by Platinum‐Assisted Chemical Etching and Gold Electroplating

Self-aligned fabrication of high-aspect ratio high-resolution x-ray gratings

Fabrication of Metallic Patterns on Highly Curved Substrates Via Nanoimprint Lithography in Association with an Etch-in Process

Filling high aspect-ratio nano-structures by atomic layer deposition and its applications in nano-optic devices and integrations

Fabrication of High-Aspect Ratio Nanogratings for Phase-based X-ray Imaging

A Novel Pmma/Neb Bilayer Process for Sub-20 Nm Gold Nanoslits by A Selective Electron Beam Lithography and Dry Etch

In Situ Nano-Indentation of a Gold Sub-Micrometric Particle Imaged by Multi-Wavelength Bragg Coherent X-ray Diffraction

Vacuum Formed Temporary Spherical and Toroidal Bent Crystal Analyzers for High Resolution X-ray Spectroscopy

Improving adhesion quality of SU-8 to gold thin film for absorption grating fabrication in x-ray phase-contrast imaging

Anisotropic strain variations during the confined growth of Au nanowires

Atomic Gold–enabled Three-Dimensional Lithography for Silicon Mesostructures

Two-Stage Tunneling-Dominated Electrodeposition for Large-Scale Production of Ultralong Wavy Metal Microstructures on Native Oxide Layer-Passivated Si Electrode with Specific Surface Configuration

From Chip Size to Wafer-Scale Nanoporous Gold Reliable Fabrication Using Low Currents Electrochemical Etching

Three-Dimensional Topography of High-Aspect Ratio Trenches by Sample-Induced Aberration-Compensable Coherence Scanning Interferometry

High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication