Abstract:Atomic Layer Deposition (ALD) is very attractive for producing optical quality thin films, including transparent barrier films on metal-coated astronomical mirrors. To date, ALD of mirror coatings has been limited to relatively small-sized substrates. A new ALD tool has been designed, constructed, and tested to apply uniform protective coatings over a 0.9 m diameter substrate in a 1 m diameter scale deposition plane. The new tool, which we have named the meter scale ALD system (MSAS), employs a unique chamber design that isolates a large substrate surface to be coated by utilizing the substrate as a wall of the reaction chamber. The MSAS is mechanically designed to be rapidly reconfigurable for selective area coating of custom substrates with arbitrary shape, size, and permanent backside hardware attachments. The design, implementation, results, and future applications of this new tool are discussed for coating large-area optical substrates, specifically protective coatings for silver mirrors, and other future large astronomical optics. To demonstrate the potential of this new design, aluminum oxide was deposited by thermal ALD using trimethylaluminum and water at a low reaction temperature of 60 °C. Growth rate and uniformity, which are dependent on precursor pulse times and chamber purge times, show that the two half-reactions occur in a saturated regime, matching typical characteristics of ideal ALD behavior. Aluminum oxide deposition process parameters of the MSAS are compared with those of a conventional 100 mm wafer-scale ALD tool, and saturated ALD growth over the 0.9 m substrate is realized with a simple scaling factor applied to precursor pulse and purge times. This initial test shows that lateral thickness uniformity across a 0.9 m substrate is within 2.5% of the average film thickness, and simple steps to realize 1% uniformity have been identified for next growths. Results show promising application of transparent robust dielectric films as uniform coatings across large optical components scaled to meter-sized substrates.

Chemical corrosion protection of optical components using atomic layer deposition.

Atomic Layer Deposition and Its Applications in Optical Thin Films

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Ultrathin protective coatings by atomic layer engineering for far ultraviolet aluminum mirrors

Effect of intermediate layers on atomic layer deposition-aluminum oxide protected silver mirrors

Precise broad-band anti-refection coating fabricated by atomic layer deposition

Preparation of Anti-Reflection Coatings on Quartz Tube Surfaces Based on Atomic Layer Deposition

Scaling Atomic Layer Deposition to Astronomical Optic Sizes: Low-Temperature Aluminum Oxide in a Meter-Sized Chamber

Atomic Layer Deposition of Al2O3 and TiO2 Multilayers for Application As Broadband Antireflection Coating

Performance and prospects of far ultraviolet aluminum mirrors protected by atomic layer deposition

Wide-angle Broadband Antireflection Coatings with Nano-Taper Hydrated Alumina Film.

Anti-Corrosion Property of Atomic Layer Deposition Films for Anodized Aluminum

Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications

Atomic Layer Deposited Protective Coating of Aluminum Oxide on Silver-based Telescope Mirror A Comparison Between a Pure Ozone and H2O Precursor

Al mirrors in vacuum ultraviolet region

CATHODICALLY ELECTROCHEMICAL-ASSISTED DEPOSITION AND PROTECTIVE PROPERTIES OF SILANE FILMS

Atomic layer deposition of chromium oxide—An interplay between deposition and etching

Ultra-thin Al2O3 films grown by atomic layer deposition for corrosion protection of copper

Anti-Reflective Coatings Produced via Atomic Layer Deposition for Hybrid Polymer 3D Micro-Optics

Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers