Sub-nanometer scale depth patterning on sapphire crystal by femtosecond soft x-ray laser pulse irradiation

Katsuhiro Mikami,Masahiko Ishino,Hiroto Motoyama,Thanh-Hung Dinh,Shunya Yokomae,Gota Yamaguchi,Satoru Egawa,Kazuyuki Sakaue,Hidekazu Mimura,Takeshi Higashiguchi,Yuya Kubota,Shigeki Owada,Atsushi Iwasaki,Yuichi Inubushi,Masaharu Nishikino
DOI: https://doi.org/10.1364/OL.501589
2023-10-01
Abstract:Damage thresholds and structures on a metal aluminum and an aluminum oxide crystal induced by the soft x-ray free electron laser irradiations were evaluated. Distinctive differences in damage thresholds and structures were observed for these materials. On the aluminum oxide crystal surface, in particular, a novel, to the best of our knowledge, surface processing, which we suggest defining as "peeling," was recognized. Surface structures formed by peeling had extremely shallow patterning of sub-nanometer depth. For the newly observed peeling process, we proposed a scission of chemical bond, i.e., binding energy model, in the crystal.
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