ScAlN Based Ferroelectric Field Effect Transistors with ITO Channel

Jiangnan Liu,Z. Mi,Ding Wang,Shubham Mondal,Yixin Xiao,Ping Wang
DOI: https://doi.org/10.1109/drc58590.2023.10187033
2023-06-25
Abstract:The discovery of ferroelectricity in HfO2 has invoked renewed interest in ferroelectric field effect transistors (FeFET), wherein the channel conductance is modulated by the polarization switching of a ferroelectric gate barrier. As dimensional scaling reaches its limit, such FeFETs have emerged as the forerunners to meet the most pressing hardware-level demands for emerging computing paradigms. Even though HfO2 has been extensively used as the ferroelectric gate dielectric in such FeFETs, these devices face critical challenges in terms of ON/OFF ratio, memory window, wake-up behavior, device variability etc. These challenges can be potentially addressed by a promising new class of ferroelectrics based on Sc alloyed III-Nitrides. Scandium Aluminum Nitride (ScAlN) exhibits remarkable switchable polarization ($80-120\ \mu \mathrm{C}/\text{cm}^{2}$), tunable coercive fields (1.6-5 MV·cm−1), and robust ferroelectric properties that can translate into high-performance FeFETs when used as the ferroelectric gate barrier. On the other hand, ultrathin channel materials like Indium Tin Oxide (ITO) have been sought to circumvent several inherent limitations of 2D-van der Waals materials. An ultrathin ITO channel combined with the large switchable polarization of the emergent oxide-free ScAlN ferroelectric can be an effective way for enhanced carrier modulation, giving rise to unique memory-logic functionalities.
Computer Science,Materials Science,Physics,Engineering
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