High-performance hysteresis-free perovskite transistors through anion engineering

Huihui Zhu,Ao Liu,Kyu In Shim,Haksoon Jung,Taoyu Zou,Youjin Reo,Hyunjun Kim,Jeong Woo Han,Yimu Chen,Hye Yong Chu,Jun Hyung Lim,Hyung-Jun Kim,Sai Bai,Yong-Young Noh
DOI: https://doi.org/10.1038/s41467-022-29434-x
2022-04-01
Abstract:Despite the impressive development of metal halide perovskites in diverse optoelectronics, progress on high-performance transistors employing state-of-the-art perovskite channels has been limited due to ion migration and large organic spacer isolation. Herein, we report high-performance hysteresis-free p-channel perovskite thin-film transistors (TFTs) based on methylammonium tin iodide (MASnI3) and rationalise the effects of halide (I/Br/Cl) anion engineering on film quality improvement and tin/iodine vacancy suppression, realising high hole mobilities of 20 cm2 V-1 s-1, current on/off ratios exceeding 107, and threshold voltages of 0 V along with high operational stabilities and reproducibilities. We reveal ion migration has a negligible contribution to the hysteresis of Sn-based perovskite TFTs; instead, minority carrier trapping is the primary cause. Finally, we integrate the perovskite TFTs with commercialised n-channel indium gallium zinc oxide TFTs on a single chip to construct high-gain complementary inverters, facilitating the development of halide perovskite semiconductors for printable electronics and circuits.
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