Abstract:Nickel oxide (NiO) thin films are a well-known functional p-type material which can be used for many applications such as electrodes, sensors, and electrochromic devices. This work investigated the effect of different deposition power on the crystal structural, electrical, and optical properties of NiO thin films prepared by RF magnetron sputtering at room temperature in a pure argon atmosphere. The structural and optical properties of NiO thin films were examined by using X-ray diffraction and UV–Vis-NIR spectrum, respectively. The thickness and the composition of NiO thin films were analyzed by glow discharge spectrum, and the thickness increased with increasing deposition power. SEM observations showed that the surface particle sizes of NiO thin films increased with increasing deposition power. The crystal structure varied from amorphous phase to (200) orientation as the deposition power increased from 75 to 150 W. The electrical results showed that the 125 W-deposited NiO thin films had the lowest resistivity and the largest mobility and carrier concentration. The absorption edges in the UV region shifted toward lower optical length as deposition power (or thickness) increased. Findings from GDS analysis indicated that the obtained NiO thin films were Ni-rich non-stoichiometric films, which possessed excellent electronic properties.

Properties of Li-Doped NiO Thin Films Prepared by RF-Magnetron Sputtering

Structure and characteristics of Li-doped NiO thin films prepared by using pulsed-laser deposition process

Effect of Li doping on the structural, linear and nonlinear optical properties of NiO thin films

Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Properties of the Highly Textured (200) NiO Thin Film Deposited by RF Magnetron Sputtering

Electrical and Optical Properties of Li-doped Ni–Si–O Thin Films

Effects of process parameters on the LaNiO3 thin films deposited by radio-frequency magnetron sputtering

Preparation and Properties of NiO Films Via Sol-gel Process and Spin-coating

Electrochromic Properties of Li- Doped NiO Films Prepared by RF Magnetron Sputtering

Annealing environment dependent electrical and chemical state correlation of Li-doped NiO

Transparent Conductive P-Type Lithium-Doped Nickel Oxide Thin Films Deposited by Pulsed Plasma Deposition

Investigation of the properties of nanostructured Li-doped NiO films using the modified spray pyrolysis method

Tunable Electrical Properties of NiO Thin Films and P-Type Thin-Film Transistors

Li Doped ZnO Thin Film: Effect of Substrate Temperature on Structure, Optical and Electrical Properties

Electrical and Magnetic Properties of ZnNiO Thin Films Deposited by Pulse Laser Deposition

Influence of substrate temperature on electrical and optical properties of p-type semitransparent conductive nickel oxide thin films deposited by radio frequency sputtering

Fabrication of P‐type Li‐Doped ZnO Films by RF Magnetron Sputtering

Dopant Concentration Influence on the Optical Properties of NiO Thin Films Doped by Al and Nb Deposited by DC and RF Magnetron Sputtering

Electronic and transport properties of Li-doped NiO epitaxial thin films

Fabrication of Li-Doped NiO Thin Films by Ultrasonic Spray Pyrolysis and Its Application in Light-Emitting Diodes

Tuning the Electrical Properties of NiO Thin Films by Stoichiometry and Microstructure