Abstract:The deposition of nickel oxide (NiO x ) thin film from an acetylacetonate source using many solution-based techniques has been avoided owing to its poor solubility in alcohol solvents. From this perspective, this work provides a systematic investigation of the development of NiO x thin film, using a combinative approach of ultrasonic spray pyrolysis (USP) and Li dopant for the synthesis and optimization of structural and optoelectronic properties of the films. An in-depth comparative analysis of nickel acetylacetonate-based precursor, employing acetonitrile and methanol as solvents, is provided. It is demonstrated that USP from acetylacetonate precursor yielded uniform, well-compact, and transparent films, with polycrystalline cubic NiO x crystal structures. By screening the deposition temperature in the range of 300–450°C, a temperature of 400°C was identified as an optimal processing temperature leading to uniform, compact, highly transparent, and p-type conductive films. At optimized deposition conditions (400°C), lithium-doped NiO x (Li:NiO x ) thin film was deposited. The shift of the main (200) XRD peak position from 43.48° (0-Li:NiO x ) to 43.56° (60-Li:NiO x ) indicated Li incorporation into the NiO x lattice. An X-ray photoelectron spectroscopy (XPS) study was employed to unravel the incorporation of Li into the deposited Li:NiO x thin films. With the deconvolution of the Ni 2p core level for the as-deposited (0, 60)-Li:NiO x films, the intensity of Ni 3+ related peak was found to increase slightly with Li doping. Furthermore, all the deposited Li:NiO x thin films showed p-type conductivity behavior, and the resistivity was reduced from 10 4 Ωcm (0-Li:NiO x ) to 10 2 Ωcm (60-Li:NiO x ). Based on these results, the deposited NiO x and Li:NiO x thin films suggested that USP-deposited Li:NiO x is highly suitable for application in inverted structure solar cells as the hole transport layer.

Structure and characteristics of Li-doped NiO thin films prepared by using pulsed-laser deposition process

Properties of Li-Doped NiO Thin Films Prepared by RF-Magnetron Sputtering

Effect of Li doping on the structural, linear and nonlinear optical properties of NiO thin films

Fabrication of Li-Doped NiO Thin Films by Ultrasonic Spray Pyrolysis and Its Application in Light-Emitting Diodes

Preparation and characterization of p- NiO:Li thin films as schottky photodiode

Electrical and Optical Properties of Li-doped Ni–Si–O Thin Films

LiNbO3 Thin Film Prepared by Pulsed Laser Deposition

Optical and Structural investigations of LiNbO3 thin films by PLD

Lithium doping in spray-pyrolyzed NiO thin films: results on their microstructural, optical and electrochromic properties

Spray deposition and characterization of nanostructured Li doped NiO thin films for application in dye-sensitized solar cells

Annealing environment dependent electrical and chemical state correlation of Li-doped NiO

Preparation and Properties of NiO Films Via Sol-gel Process and Spin-coating

Investigation of the properties of nanostructured Li-doped NiO films using the modified spray pyrolysis method

Electronic and transport properties of Li-doped NiO epitaxial thin films

Electrical and Magnetic Properties of ZnNiO Thin Films Deposited by Pulse Laser Deposition

Li2O-V2O5-SiO2 thin films prepared by pulsed laser deposition

Microstructure of LiNbO3 Thin Films Grown on Silicon Substrates by Pulsed Laser Deposition

Fabrication and characterization of NiO thin film by thermal oxidation method

Enhanced physical properties of pulsed laser deposited NiO films via annealing and lithium doping for improving perovskite solar cell efficiency

Combinative solution processing and Li doping approach to develop p-type NiO thin films with enchanced electrical properties

Transparent Conductive P-Type Lithium-Doped Nickel Oxide Thin Films Deposited by Pulsed Plasma Deposition