Abstract:Molybdenum disulfide (MoS$_2$) is a high-potential material for nanoelectronic applications, especially when thinned to a few layers. Liquid phase exfoliation enables large-scale fabrication of thin films comprising single- and few-layer flakes of MoS$_2$ or other transition-metal dichalcogenides (TMDCs), exhibiting variations in flake size, geometry, edge terminations, and overlapping areas. Electronic conductivity of such films is thus determined by two contributions: the intraflake conductivity, reflecting the value of each single layer, and charge transport across these overlapping flakes. Employing first-principles simulations, we investigate the influence of various edge terminations and of the overlap between flakes on the charge transport in MoS$_2$ film models. We identify characteristic electronic edge states originating from the edge atoms and their chemical environment, which resemble donor and acceptor states of doped semiconductors. This makes either electrons or holes to majority carriers and enables selective control over the dominant charge carrier type (n-type or p-type). Compared to pristine nanosheets, overlapping flakes exhibit lower overall conductance. In the best performing hexagonal flakes occurring in Mo-rich environments, the conductance is reduced by 20% compared to the pristine layer, while the drop by 40%, and 50% is predicted for truncated triangular, and triangular flakes, respectively in S-rich environments. An overlap of 6.5 nm is sufficient to achieve the highest possible interflake conductance. These findings allow for a rational optimization of experimental conditions for the preparation of MoS$_2$ and other TMDC semiconducting thin films.

What problem does this paper attempt to address?

This paper aims to solve the problem of how to optimize the electrical conductivity of molybdenum disulfide (MoS₂) thin films. Specifically, the research focuses on the following aspects: 1. **The influence of layer overlap on electrical conductivity**: By studying the charge - transfer characteristics of MoS₂ flakes with different shapes and edge terminations when they overlap, the authors attempt to understand how these factors affect the overall electrical conductivity. 2. **The influence of edge terminations**: Different edge terminations (such as ZZ - Mo, ZZ - S, etc.) lead to different electronic states, which in turn affect the electrical conductivity. Research shows that some edge terminations can form donor or acceptor states similar to those in doped semiconductors, thereby controlling the main carrier type (n - type or p - type). 3. **The influence of environmental conditions**: MoS₂ flakes exhibit different morphologies and properties in different chemical environments (such as Mo - rich or S - rich). For example, hexagonal flakes formed in a Mo - rich environment have better transport properties, while truncated triangular and triangular flakes formed in an S - rich environment perform poorly. 4. **The optimal overlap length**: Research indicates that an overlap length of 6.5 nm can achieve the highest inter - layer electrical conductivity. Beyond this length, the electrical conductivity will not be further improved. ### Main findings - **Decrease in electrical conductivity**: Compared with the original single - layer, the total electrical conductivity of the overlapping flakes decreases, with the decrease ranging from 20% to 50%. - **The role of edge states**: The ZZ - Mo, ZZ - Mo - S₂ and ZZ - S - Mo edge states show constructive interference, which is beneficial to n - type semiconductors; while the ZZ - S edge state shows destructive interference, resulting in p - type semiconductors. - **The influence of layer spacing**: Compressing the layer spacing by 1 Å can significantly improve the electrical conductivity (27% for ZZ - Mo and 22% for ZZ - S), while expanding the layer spacing will reduce the electrical conductivity. ### Conclusion Through first - principles calculations, the authors provide computational guidelines for optimizing the electrical conductivity of MoS₂ thin films. The research results show that in addition to the flake size, the degree of overlap between flakes, the type of edge termination, and the layer spacing are all important factors for evaluating transport properties. In particular, hexagonal flakes in a Mo - rich environment and an appropriate overlap length (such as 6.5 nm) can achieve the best transport properties. Therefore, in order to obtain the best electrical properties, precise control of the flake geometry and the overlap method is required. I hope this information can help you better understand the core issues and research focuses of this paper. If you have more questions or need further explanations, please feel free to let me know!

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