Abstract:Efficient fiber-chip coupling interfaces are critically important for integrated photonics. Since surface gratings diffract optical signals vertically out of the chip, these couplers can be placed anywhere in the circuit allowing for wafer-scale testing. While state-of-the-art grating couplers have been developed for silicon-on-insulator (SOI) waveguides, the moderate index contrast of silicon nitride (SiN) presents an outstanding challenge for implementing efficient surface grating couplers on this platform. Due to the reduced grating strength, a longer structure is required to radiate the light from the chip which produces a diffracted field that is too wide to couple into the fiber. In this work, we present a novel grating coupler architecture for silicon nitride photonic integrated circuits that utilizes an amorphous silicon (α-Si) overlay. The high refractive index of the α-Si overlay breaks the coupler's vertical symmetry which increases the directionality. We implement subwavelength metamaterial apodization to optimize the overlap of the diffracted field with the optical fiber Gaussian mode profile. Furthermore, the phase of the diffracted beam is engineered to focalize the field into an SMF-28 optical fiber placed 55 μm above the surface of the chip. The coupler was designed using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations supported by genetic algorithm optimization. Our grating coupler has a footprint of 26.8 × 32.7 μm 2 and operates in the O -band centered at 1.31 μm. It achieves a high directionality of 85% and a field overlap of 90% with a target fiber mode size of 9.2 μm at the focal plane. Our simulations predict a peak coupling efficiency of − 1.3 dB with a 1-dB bandwidth of 31 nm. The α-Si/SiN grating architecture presented in this work enables the development of compact and efficient optical interfaces for SiN integrated photonics circuits with applications including optical communications, sensing, and quantum photonics.

Triangular cross-section grating couplers for integrated quantum nanophotonic hardware in silicon carbide

Quantum photonics in triangular-cross-section nanodevices in silicon carbide

Triangular Cross-Section Beam Splitters in Silicon Carbide for Quantum Information Processing

Triangular Quantum Photonic Devices with Integrated Detectors in Silicon Carbide

Utilizing photonic band gap in triangular silicon carbide structures for efficient quantum nanophotonic hardware

Wafer-Scale Integration of Freestanding Photonic Devices with Color Centers in Silicon Carbide

Experimental Demonstration of an Apodized-Imaging Chip-Fiber Grating Coupler for Si_3N_4 Waveguides

Quantum Information Processing With Integrated Silicon Carbide Photonics

High-efficiency Apodized-Imaging Chip-Fiber Grating Coupler for Silicon Nitride Waveguides

Broadband Couplers for Hybrid Silicon-Chalcogenide Glass Photonic Integrated Circuits

High-efficiency Wideband SiNx-on-SOI Grating Coupler with Low Fabrication Complexity.

Quantum Photonics Incorporating Color Centers in Silicon Carbide and Diamond

Fabrication-friendly High-Efficiency Silicon Nitride Grating Coupler

High-Efficiency Metamaterial-Engineered Grating Couplers for Silicon Nitride Photonics

Scalable Quantum Photonics with Single Color Centers in Silicon Carbide

High-efficiency self-focusing metamaterial grating coupler in silicon nitride with amorphous silicon overlay

Monolithic Polarizing Circular Dielectric Gratings on Bulk Substrates for Improved Photon Collection from InAs Quantum Dots

Broadband single-mode planar waveguides in monolithic 4H-SiC

4H-silicon-carbide-on-insulator for integrated quantum and nonlinear photonics