Abstract:The availability of thin-film lithium niobate on insulator (LNOI) and advances in processing have led to the emergence of fully integrated LiNbO3 electro-optic devices, including low-voltage, high-speed modulators, electro-optic frequency combs, and microwave-optical transducers. Yet to date, LiNbO3 photonic integrated circuits (PICs) have mostly been fabricated using non-standard etching techniques that lack the reproducibility routinely achieved in silicon photonics. Widespread future application of thin-film LiNbO3 requires a reliable and scalable solution using standard processing and precise lithographic control. Here we demonstrate a heterogeneously integrated LiNbO3 photonic platform that overcomes the abovementioned challenges by employing wafer-scale bonding of thin-film LiNbO3 to planarized low-loss silicon nitride (Si3N4) photonic integrated circuits, a mature foundry-grade integrated photonic platform. The resulting devices combine the substantial Pockels effect of LiNbO3 with the scalability, high-yield, and complexity of the underlying Si3N4 PICs. Importantly, the platform maintains the low propagation loss (<0.1 dB/cm) and efficient fiber-to-chip coupling (<2.5 dB per facet) of the Si3N4 waveguides. We find that ten transitions between a mode confined in the Si3N4 PIC and the hybrid LiNbO$_3$ mode produce less than 0.8 dB additional loss, corresponding to a loss per transition not exceeding 0.1 dB. These nearly lossless adiabatic transitions thus link the low-loss passive Si3N4 photonic structures with electro-optic components. We demonstrate high-Q microresonators, optical splitters, electrically tunable photonic dimers, electro-optic frequency combs, and carrier-envelope phase detection of a femtosecond laser on the same platform, thus providing a reliable and foundry-ready solution to low-loss and complex LiNbO3 integrated photonic circuits.

Thin Film Lithium Niobate Electro-optic Isolator Fabricated by photolithography assisted chemo-mechanical etching (PLACE)

Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching

High-Performance Electro-Optic Modulator on Silicon Nitride Platform with Heterogeneous Integration of Lithium Niobate

Compact low-half-wave-voltage thin film lithium niobate electro-optic phase modulator fabricated by photolithography assisted chemo-mechanical etching

Ultra-high Efficiency Electro-optic Modulator on Thin-film Lithium Niobate

Design of a Broadband and Low Loss TM Magneto-Optical Waveguide Isolator Based on Lithium Niobate on Insulator

High-efficiency Thin-Film Lithium Niobate Modulator with Highly Confined Optical Modes

Compact low-half-wave-voltage thin film lithium niobate electro-optic phase modulator fabricated by photolithography-assisted chemo-mechanical etching (PLACE)

Thinning of Lithium Niobate Wafers with a Novel Designed Lapping Tool and Measurements

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching

Visible-telecom broadband optical isolator based on dynamic modulation in thin-film lithium niobate

Polarization-Insensitive Electrooptic Modulation on Anisotropic Thin-Film Lithium Niobate

Laser inscribed waveguide optical isolators in iron-doped lithium niobate

Compact and Low Loss Magneto-Optical Waveguide Isolator for TE Mode Based on Lithium Niobate on Insulator

Parasitic conduction loss of lithium niobate on insulator platform

Wideband Thin-Film Lithium Niobate Modulator with Low Half-Wave-voltage Length Product

Monolithic Thin Film Lithium Niobate Electro-Optic Modulator with over 110 GHz Bandwidth

Broadband Thin-Film Lithium Niobate Electro-Optic Modulator

Monolithically integrated active passive waveguide array fabricated on thin film lithium niobate using a single continuous photolithography process

A heterogeneously integrated lithium niobate-on-silicon nitride photonic platform

Tightly confining lithium niobate photonic integrated circuits and lasers