Abstract:LNOI devices have emerged as prominent contributors to photonic integrated circuits (PICs), benefiting from their outstanding performance in electro-optics, acousto-optics, nonlinear optics, etc. Due to the physical properties and current etching technologies of LiNbO3, slanted sidewalls are typically formed in LNOI waveguides, causing polarization-related mode hybridization and crosstalk. Despite the low losses achieved with fabrication advancements in LNOI, such mode hybridization and crosstalk still significantly limit the device performance by introducing polarization-related losses. In this paper, we propose a vertically etched LNOI construction. By improving the geometrical symmetry in the waveguides, vertical sidewalls could adequately mitigate mode hybridization in common waveguide cross sections. Taking tapers and bends as representatives of PIC components, we then conducted theoretical modeling and simulations, which showed that vertical etching effectively exempts devices from polarization-related mode crosstalk. This not only improves the polarization purity and input mode transmittance but also enables lower polarization-related losses within more compact structures. As a demonstration of fabrication feasibility, we innovatively proposed a two-step fabrication technique, and successfully fabricated waveguides with vertical sidewalls. Such vertical etching technology facilitates the development of next-generation high-speed modulators, nonlinear optical devices, and other advanced photonic devices with lower losses and a smaller footprint, driving further innovations in both academic research and industrial applications.

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