Abstract:Photonic integrated circuits are indispensible for data transmission within modern datacenters and pervade into multiple application spheres traditionally limited for bulk optics, such as LiDAR and biosensing. Of particular interest are ferroelectrics such as Lithium Niobate, which exhibit a large electro-optical Pockels effect enabling ultrafast and efficient modulation, but are difficult to process via dry etching . For this reason, etching tightly confining waveguides - routinely achieved in silicon or silicon nitride - has not been possible. Diamond-like carbon (DLC) was discovered in the 1950s and is a material that exhibits an amorphous phase, excellent hardness, and the ability to be deposited in nano-metric thin films. It has excellent thermal, mechanical, and electrical properties, making it an ideal protective coating. Here we demonstrate that DLC is also a superior material for the manufacturing of next-generation photonic integrated circuits based on ferroelectrics, specifically Lithium Niobate on insulator (LNOI). Using DLC as a hard mask, we demonstrate the fabrication of deeply etched, tightly confining, low loss photonic integrated circuits with losses as low as 5.6 dB/m. In contrast to widely employed ridge waveguides, this approach benefits from a more than 1 order of magnitude higher area integration density while maintaining efficient electro-optical modulation, low loss, and offering a route for efficient optical fiber interfaces. As a proof of concept, we demonstrate a frequency agile hybrid integrated III-V Lithium Niobate based laser with kHz linewidth and tuning rate of 0.7 Peta-Hertz per second with excellent linearity and CMOS-compatible driving voltage. Our approach can herald a new generation of tightly confining ferroelectric photonic integrated circuits.

Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching

Thin Film Lithium Niobate Electro-optic Isolator Fabricated by photolithography assisted chemo-mechanical etching (PLACE)

Compact low-half-wave-voltage thin film lithium niobate electro-optic phase modulator fabricated by photolithography-assisted chemo-mechanical etching (PLACE)

Ultra-high Efficiency Electro-optic Modulator on Thin-film Lithium Niobate

Lithium niobate thin film electro-optic modulator

Compact low-half-wave-voltage thin film lithium niobate electro-optic phase modulator fabricated by photolithography assisted chemo-mechanical etching

Thinning of Lithium Niobate Wafers with a Novel Designed Lapping Tool and Measurements

Polarization-Insensitive Electrooptic Modulation on Anisotropic Thin-Film Lithium Niobate

Poling-assisted hydrofluoric acid wet etching of thin-film lithium niobate

High-efficiency Thin-Film Lithium Niobate Modulator with Highly Confined Optical Modes

High-efficiency Electro-Optic Modulators in Lithium Niobate on Insulator

Integrated electro-optics on thin-film lithium niobate

High-efficiency thin-film lithium niobate apodized grating coupler utilizing negative diffraction angle

Thin film lithium niobate electro-optic modulator with reduced half-wave voltage length product through design

Recent Progress in Thin-Film Lithium Niobate Photonic Crystal [Invited]

Tightly confining lithium niobate photonic integrated circuits and lasers

LiNbO3 Crystals: from Bulk to Film

Fabrication of lithium niobate metasurfaces via a combination of FIB and ICP-RIE

Optical isolator based on the electro-optic effect in periodically poled lithium niobate with the addition of a half domain.

Lithium tantalate electro-optical photonic integrated circuits for high volume manufacturing

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H$_2$ and SF$_6$ plasmas