Fully vertical AlN-on-SiC Schottky barrier diodes

Hironori Okumura,Masataka IMURA,Fuga Miyazawa,Lorenzo Mainini
DOI: https://doi.org/10.35848/1347-4065/ad7dc3
IF: 1.5
2024-10-17
Japanese Journal of Applied Physics
Abstract:We demonstrated fully vertical Schottky barrier diodes (SBDs) that have a Si-doped AlN drift layer directly grown on an n-type 4H-SiC substrate by metal-organic CVD. The AlN SBD with a Ni anode showed a clear rectifying characteristic at 300–500 K and a rectification ratio of about 10–2. We found that the leakage current of the vertical AlN-on-SiC devices is affected by defects in the AlN drift layer and Schottky interface.
physics, applied
What problem does this paper attempt to address?