Reduction of copper oxides by UV radiation and atomic hydrogen studied by XPS

T.H. Fleisch,G.J. Mains
DOI: https://doi.org/10.1016/0378-5963(82)90134-9
1982-01-01
Applications of Surface Science
Abstract:The reduction of polycrystalline cupric oxide (CuO) and cuprous oxide (Cu2O) by UV irradiation and by atomic hydrogen was investigated with X-ray photoelectron spectroscopy (XPS or ESCA). UV photons from a low pressure mercury lamp(λ=2537A, hv=4.8cV) slowly reduce both CuO and Cu2O at room temperature. After approximately 10 h of irradiation the sample surfaces appear completely reduced to metallic Cu. This indicates that after that time the top 30 A of the sample pellets, the approximate sampling depth of XPS, have been reduced. Further irradiation causes the reduction to progress through the pellet interior and bulk phase. The sample color changes from dark to metallic copper. Photochemically generated hydrogen atoms reduce copper oxides at ambient temperatures. The reduction rate is about 10 times faster than the one caused by UV light alone. The reduction of Cu2O is in both cases slightly slower than the one of CuO. The degree of reduction has been calculated from XPS data in different ways involving the atomic ratio of O/Cu, the relative intensity of the shake-up structure of CuO, and changes in the structure of the Cu L3M45M45 Auger line. Freshly reduced Cu surfaces are sensitive to air exposure. They oxidize easily to Cu2O.
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