UV-laser modification and selective ion-beam etching of amorphous vanadium pentoxide thin films

Alexander Cheremisin,Vadim Putrolaynen,Andrei Velichko,Alexander Pergament,Nikolay Kuldin,Alexander Grishin
DOI: https://doi.org/10.1002/pssa.200824175
2020-01-08
Abstract:We present the results on excimer laser modification and patterning of amorphous vanadium pentoxide films. Wet positive resist-type and Ar ion-beam negative resist-type etching techniques were employed to develop UV-modified films. V2O5 films were found to possess sufficient resistivity compared to standard electronic materials thus to be promising masks for sub-micron lithog-raphy
Applied Physics,Materials Science
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