Oxidation kinetic behavior of SiBCN-Ta4HfC5 ceramics at 1600 °C

Bingzhu Wang,Daxin Li,Zhihua Yang,Delong Cai,Dechang Jia,Jingyi Guan,Yu Zhou,Bingzhu Wang,Daxin Li,Zhihua Yang,Delong Cai,Dechang Jia,Jingyi Guan,Yu Zhou
DOI: https://doi.org/10.1016/j.corsci.2022.110552
IF: 7.72
2022-10-01
Corrosion Science
Abstract:In this study, the morphological/microstructural evolution and oxidation behavior of SiBCN-Ta4HfC5 ceramics at 1600 °C were explored and the oxidation kinetic mechanisms were revealed. The results show that the distribution form of tantalum hafnium oxide changes from aggregation distribution in the form of particles to annular distribution along the SiO2 boundary. Oxidation kinetic constant of SiBCN-Ta4HfC5 is 215.97 μm2/h, while pure SiBCN is kp = 1267.70 μm2/h. The excellent oxidation resistance of SiBCN-Ta4HfC5 is mainly attributed to the forming dense oxide layer, which effectively hinders the oxygen diffusion inward.
materials science, multidisciplinary,metallurgy & metallurgical engineering
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