Single-electron shuttle based on a silicon quantum dot

K. W. Chan,M. Mottonen,A. Kemppinen,N. S. Lai,K. Y. Tan,W. H. Lim,A. S. Dzurak
DOI: https://doi.org/10.1063/1.3593491
2011-10-05
Abstract:We report on single-electron shuttling experiments with a silicon metal-oxide-semiconductor quantum dot at 300 mK. Our system consists of an accumulated electron layer at the Si/SiO_2 interface below an aluminum top gate with two additional barrier gates used to deplete the electron gas locally and to define a quantum dot. Directional single-electron shuttling from the source and to the drain lead is achieved by applying a dc source-drain bias while driving the barrier gates with an ac voltage of frequency f_p. Current plateaus at integer levels of ef_p are observed up to f_p = 240 MHz operation frequencies. The observed results are explained by a sequential tunneling model which suggests that the electron gas may be heated substantially by the ac driving voltage.
Quantum Physics,Materials Science
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