Single hole transport in a silicon metal-oxide-semiconductor quantum dot

R. Li,F. E. Hudson,A. S. Dzurak,A. R. Hamilton
DOI: https://doi.org/10.1063/1.4826183
IF: 4
2013-10-14
Applied Physics Letters
Abstract:We describe a planar silicon metal-oxide-semiconductor (MOS) based single hole transistor, which is compatible with conventional Si complementary MOS fabrication. A multi-layer gate design gives independent control of the carrier density in the dot and reservoirs. Clear Coulomb blockade oscillations are observed, and source-drain biasing measurements show that it is possible to deplete the dot down to the few hole regime, with excited states clearly visible. The architecture is sufficiently versatile that a second hole dot could be induced adjacent to the first one.
physics, applied
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