Release behavior of an interstitial helium atom from 3 C -SiC(100) subsurface: A first-principles study

Jinting Liang,Xian Tang,Guodong Cheng,Nan Zhou,Jie Tan,Yang Zhang
DOI: https://doi.org/10.1016/j.nimb.2024.165399
2024-05-19
Abstract:The annealing-promoted He release process in irradiated SiC remains unclear. Herein the atomistic release behavior of a He atom from 3 C -SiC(1 0 0) subsurface is investigated by density functional theory calculations. The results show that the interstitial He atom in the 3 C -SiC(1 0 0) subsurface tends to diffuse to the surface by overcoming a diffusion barrier of 0.72 eV, rather than to infiltrate into the slab interior, supporting a bulk-diffusion-limited mechanism for He release from SiC. The He atom can spontaneously diffuse on the 3 C -SiC(1 0 0) surface, suggesting a retarding effect on He release from irradiated SiC. The results provide deeper insight into the release mechanism of He defects in irradiated SiC and are useful for improving defect recovery strategies.
physics, nuclear, atomic, molecular & chemical,nuclear science & technology,instruments & instrumentation
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