A Numerical Study of Scaling Issues for Schottky Barrier Carbon Nanotube Transistors

Jing Guo,Supriyo Datta,Mark Lundstrom
DOI: https://doi.org/10.1109/TED.2003.821883
2003-06-11
Abstract:We performed a comprehensive scaling study of Schottky barrier carbon nanotube transistors using self-consistent, atomistic scale simulations. We restrict our attention to Schottky barrier carbon nanotube FETs whose metal source/drain is attached to an intrinsic carbon nanotube channel. Ambipolar conduction is found to be an important factor that must be carefully considered in device design, especially when the gate oxide is thin. The channel length scaling limit imposed by source-drain tunneling is found to be between 5nm and 10nm, depending on the off-current specification. Using a large diameter tube increases the on-current, but it also increases the leakage current. Our study of gate dielectric scaling shows that the charge on the nanotube can play an important role above threshold.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The problem that this paper attempts to solve is related to the scaling of Schottky Barrier Carbon Nanotube Transistors (SB - CNTFETs). Specifically, the research aims to comprehensively explore the performance changes of SB - CNTFETs under different parameters through self - consistent atomic - scale simulations, especially in the following aspects: 1. **Bipolar conduction phenomenon**: When the gate oxide layer is very thin, SB - CNTFETs exhibit significant bipolar conduction characteristics, which pose a challenge to device design. The research needs to understand how to consider this characteristic in the design, especially when the gate oxide layer is thin. 2. **Channel length scaling limit**: What is the channel length scaling limit determined by the source - drain tunneling effect? Research shows that this limit is approximately between 5nm and 10nm, depending on the requirements of the off - state current. 3. **Influence of nanotube diameter**: Increasing the nanotube diameter can increase the on - current, but it will also increase the leakage current at the same time. Therefore, it is necessary to balance the relationship between the two. 4. **Influence of gate insulator thickness and dielectric constant**: How do the thickness and dielectric constant of the gate insulator affect device performance? Research shows that a high - κ gate insulator can improve the on - current, similar to the case of MOSFETs. 5. **Source - drain voltage scaling**: How does the change of the source - drain voltage affect the I - V characteristics of the device? Reducing the power supply voltage can reduce the minimum leakage current, but it will also affect the on - current. 6. **Sub - threshold swing**: Can the sub - threshold swing of SB - CNTFETs reach the ideal value (60mV/dec), or is it limited by other factors? Through these studies, the author hopes to provide a theoretical basis for optimizing the design of SB - CNTFETs and reveal its potential and limitations in high - performance applications.