Abstract:Pulsed chemical vapor deposition (P-CVD) is a promising technology for the surface modification of TiO2 particles. For the scale-up application of P-CVD, a custom-designed rotary reactor and corresponding coating process at room temperature was developed in the present work. The obtained SiO2-coated TiO2 particles were characterized by various measures including high-resolution transmission electron microscope, Fourier transform infrared spectroscopy, X-ray diffraction, etc. The results illustrated that the SiO2 films with a thickness of (3.7 ± 0.7) nm were successfully deposited onto the surface of TiO2 particles. According to the dye degradation tests and acid solubility measurement, the deposited film can effectively inhibit the photocatalytic activity and enhance the weatherability of the TiO2 particles. Zeta potential measurements showed that the SiO2-coated TiO2 is possible to be stably dispersed in the pH range of 6.9–11.6. The coating process made the whiteness of TiO2 particles decreased slightly but still sufficient (97.3 ± 0.1) for application. Furthermore, the properties of the TiO2 particles coated by P-CVD were compared with the particles coated by traditional wet chemical deposition. It is shown that the P-CVD can produce thinner but denser films with better photoactivity suppression performance. The developed coating process within the rotary reactor was proved practically feasible and convenient for the scale-up production of SiO2-coated TiO2 via P-CVD.

Deposition of thin TiO 2 films on fluorophlogopite particle surface by CVD in fluidized bed reactor to prepare silver pearlescent pigments

APPLICATION AND OPTICAL PROPERTIES OF TiO_2 THINFILMS PREPARED BY CHEMICAL VAPOUR DEPOSITION

Influence of Iron Dopant on Crystallization and Photo-Induced Hydrophilicity of TiO2 Thin Films

Crystallization Behavior and Hydrophilic Performances of V2O5–TiO2 Films Prepared by Sol–gel Dip-Coating

Formation of Silver Nano Particles in Percolative Ag‐PbTiO 3 Composite Dielectric Thin Film

Application of pulsed chemical vapor deposition on the SiO2-coated TiO2 production within a rotary reactor at room temperature

Preparation and Characteristic of FexSy/TiO2 Composite Material Film

TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties

Deposition of TiO2 by Medium Frequency Reactive Dual Magnetron Sputtering

Crystallization Behaviors of TiO2 Films Derived from Thermal Oxidation of Evaporated and Sputtered Titanium Films

Synthesis of nano-sized TiC powders by designing chemical vapor deposition system in a fluidized bed reactor

The Coating Process of Nano-scale Hydrous Silica Film on TiO2 Particles by Chemical Deposition in Aqueous Solution

Conformal Multilayer Photocatalytic Thin Films on Fine Particles by Atmospheric Pressure Fluidized Bed Chemical Vapor Deposition

(Invited) Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition Applying for Photocatalysis

Production of TiO2 Film with Vacuum Deposition

Preparation of Silver Dispersed Pbtio3 Film by Sol-Gel Method

Preparation of TiO2 Coating Films Containing Pd Fine Particles by Sol-Gel Method

The Study on the Preparation of Titanium Dioxide Thin Film by Liquid Phase Deposition Method

Synthesis of TiCl2 powders through reactive gas phase infiltration in a fluidized bed reactor

Liquid Phase Deposition of TiO2 on a Multifunctional Template of Grafted Gallic Acid and Hexamethylenediamine (GAHD) with Enhanced Electrochemical Properties

Crystallization of Titania Films in Aqueous Solutions and Their Dye Adsorption Properties