Metal-Free Catalytic Preparation of Graphene Films on a Silicon Surface Using CO as a Carbon Source in Chemical Vapor Deposition

Lintao Liu,Wei Li,Zhengxian Li,Fei He,Haibing Lv
DOI: https://doi.org/10.3390/coatings13061052
IF: 3.236
2023-06-06
Coatings
Abstract:The metal-free synthesis of graphene films on Si substrates, the most common commercial semiconductors, is of paramount significance for graphene application on semiconductors and in the field of electronics. However, since current research mainly uses C-H gas as the carbon source in chemical vapor deposition (CVD), and Si does not have a catalytic effect on the decomposition and adsorption of C-H gas, it is challenging to prepare high-quality graphene on the Si surface directly. In this work, we report the growth of graphene directly on Si without metal catalysis by CVD using CO was selected as the carbon source. By controlling the growth temperature (1000–1150 °C), a process of 2–5 layers of graphene growth on silicon was developed. The electrical performance results showed that the graphene film had a sheet resistance of 79 Ω/sq, a resistivity of 7.06 × 10−7 Ω·m, and a carrier migration rate of up to 1473.1 cm2 V−1·S−1. This work would be a significant step toward the growth of graphene on silicon substrates with CO as the carbon source.
materials science, multidisciplinary,physics, applied, coatings & films
What problem does this paper attempt to address?
The main problem that this paper attempts to solve is: how to directly prepare high - quality graphene films on silicon (Si) substrates without using metal catalysts. Current research mainly uses hydrocarbon - containing gases (such as methane) as carbon sources, but silicon substrates have no catalytic effect on these gases, so it is difficult to directly prepare high - quality graphene on the silicon surface. This paper proposes a new method, that is, using carbon monoxide (CO) as a carbon source to directly grow graphene films on silicon substrates without metal catalysis during the chemical vapor deposition (CVD) process. Specifically, by controlling the growth temperature (1000 - 1150°C), the paper successfully grew 2 - 5 - layer graphene films on silicon substrates. Through electrical property tests, it was found that the prepared graphene films have a sheet resistance of 79 Ω/sq, a resistivity of 7.06 × 10^(-7) Ω·m and a carrier mobility as high as 1473.1 cm²/V·s. These results indicate that using CO as a carbon source can significantly improve the quality of graphene films and avoid the hydrogen doping problem caused by the presence of C - H gases in traditional methods. In conclusion, this research provides a new and effective way to directly prepare high - quality graphene films on silicon substrates and is expected to have more extensive applications in the electronics and other industries.