Fabrication of broadband wave-transparent Si 3 N 4 ceramics with octet-truss lattice structure by vat photopolymerization 3D printing technology

Zihuan Chen,Wenyan Duan,Dongyun Zhang,Xuye Wang,Tao Li,Chunyang Zhao,Quan Li,Shan Li,Bingshan Liu,Gong Wang

DOI: https://doi.org/10.1016/j.jeurceramsoc.2023.11.035

IF: 5.7

2023-12-18

Journal of the European Ceramic Society

Abstract:Vat photopolymerization 3D printing of Si 3 N 4 ceramics has attracted great attention recently. To overcome the low curing depth limitation caused by α-Si 3 N 4 , β-Si 3 N 4 with low absorbance and large particle size was selected in this paper. After printing, the effects of pressureless sintering temperatures on mechanical and dielectric properties were systematically investigated. At 1800 °C, the real permittivity of Si 3 N 4 ceramics was 7.37, and the maximum bending strength was 367 ± 75 MPa. Considering the application of Si 3 N 4 ceramics in radomes/windows, the dielectric constant of Si 3 N 4 ceramics should be further reduced. Therefore, the octet-truss lattice structure was introduced to optimize the porosity of ceramics. As the porosity increased from 25% to 36%, the real permittivity decreased from 5.56 to 4.42, and the bending strength ranged from 98 ± 7–62 ± 13 MPa. It shows that vat photopolymerization 3D printing can be a promising technology for the fabrication of wave-transparent Si 3 N 4 ceramics.

materials science, ceramics