Abstract:Sophisticated thin film growth techniques increasingly rely on the addition of a plasma component to open or widen a processing window, particularly at low temperatures. However, the addition of the plasma into the growth environment also complicates the surface dynamical evolution. Taking advantage of continued increases in accelerator-based X-ray source brilliance, this real-time study uses X-ray Photon Correlation Spectroscopy (XPCS) to elucidate the nanoscale surface dynamics during Plasma-Enhanced Atomic Layer Deposition (PE-ALD) of an epitaxial indium nitride film. XPCS examines the evolution of the coherent X-ray scattering speckle pattern, which is a fingerprint of the unique sample microstructure at each moment in time. In PE-ALD, ultrathin films are synthesized from repeated cycles of alternating self-limited surface reactions induced by temporally-separated pulses of material precursor and plasma reactant, allowing the influence of each on the evolving morphology to be examined. During the heteroepitaxial 3D growth examined here, sudden changes in surface structure during initial film growth, consistent with numerous overlapping stress-relief events, are observed. When the film becomes continuous, the nanoscale surface morphology abruptly becomes long-lived with correlation time spanning the period of the experiment. Throughout the growth experiment, there is a consistent repeating pattern of correlations associated with the cyclic growth process, which is modeled as transitions between different surface states. The plasma exposure does not simply freeze in a structure that is then built upon in subsequent cycles, but rather there is considerable surface evolution during all phases of the growth cycle.

Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge

Deposition of nano-diamond-like carbon films by an atmospheric pressure plasma gun and diagnostic by optical emission spectrum on the process

A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

Homogeneity study of fluoropolymer films modified by atmospheric pressure nitrogen plasma discharges

Chemical and Physical Effects of the Carrier Gas on the Atmospheric Pressure PECVD of Fluorinated Precursors

Tuning the Surface Properties of Oxygen-Rich and Nitrogen-Rich Plasma Polymers: Functional Groups and Surface Charge

Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses

Deposition of Thin Titania Films by Dielectric Barrier Discharge

Growth and Characterization of Fluorocarbon Thin Films from Low Pressure Tetrafluoromethane, Hexafluoroethane and Octafluorocyclobutane Plasmas

Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O$_2$ radiofrequency plasma used for polymer surface treatment

Nano-FTIR spectroscopy of surface confluent polydopamine films – What is the role of deposition time and substrate material?

Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition

Spectroscopic Study on Pulsed Laser Ablation of Graphite Target in Ecr Nitrogen Plasma for Carbon Nitride Film Deposition

Investigating the Influence of the Substrate Temperature and the Organic Precursor on the Mechanical Properties of Low‐Pressure Plasma Polymer Films

An Optical Emission Spectroscopy Study of Plasma–Precursor Interactions in Solution Precursor Plasma Spray

Characterization of transient discharges under atmospheric pressure conditions applying nitrogen photoemission and current measurements

Coherent X-ray Spectroscopy Elucidates Nanoscale Dynamics of Plasma-Enhanced Thin-Film Growth

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Characterization of microstructure and surface properties of GLC film deposited in plasma nitriding system

Film Formation from Plasma-Enabled Surface-Catalyzed Dehalogenative Coupling of a Small Organic Molecule.

Spectroscopic Study on the Evolution of Graphite Ablation Plume in ECR Argon Plasma During the Deposition of Diamond-Like Carbon Films