Enhanced Raman intensity in ZnS planar and channel waveguide structures via carbon ion implantation

Tao Liu,Yi-Cun Yao,Fei-Ran Liu,Lin Cheng,Yi-Fei Bao,Wei-Jin Kong,Mei Qiao,Tie-Jun Wang
DOI: https://doi.org/10.1016/j.optmat.2020.110733
IF: 3.754
2021-02-01
Optical Materials
Abstract:<p>Planar and channel waveguides in ZnS single crystal are fabricated by 6.0 MeV C ion implantation with fluences of 5 × 10<sup>14</sup> and 1 × 10<sup>15</sup> ion/cm<sup>2</sup> at room temperature. The optical modes for the planar waveguides are measured by using a prism coupler by the well-known <em>m</em>-line method. The near-field light intensity profiles for the planar and channel waveguides are measured by the end-face coupling setup at 633 nm and 1539 nm. The reflectivity calculation method and the finite difference beam propagation method are used to reconstruct the refractive index profile of the planar waveguides and near-field intensity distribution of planar and channel waveguides. Raman images obtained with a 532-nm laser are collected to evaluate the damage to the ZnS crystal and waveguide layers.</p>
materials science, multidisciplinary,optics
What problem does this paper attempt to address?