Nanomechanical Investigation of Thin-Film Electroceramic/Metal-Organic Framework Multilayers
James P. Best,Johann Michler,Jianxi Liu,Zhengbang Wang,Manuel Tsotsalas,Xavier Maeder,Silvana Roese,Vanessa Oberst,Jinxuan Liu,Stefan Walheim,Hartmut Gliemann,Peter G. Weidler,Engelbert Redel,Christof Woell
DOI: https://doi.org/10.1063/1.4930141
IF: 4
2015-01-01
Applied Physics Letters
Abstract:Thin-film multilayer stacks of mechanically hard magnetron sputtered indium tin oxide (ITO) and mechanically soft highly porous surface anchored metal-organic framework (SURMOF) HKUST-1 were studied using nanoindentation. Crystalline, continuous, and monolithic surface anchored MOF thin films were fabricated using a liquid-phase epitaxial growth method. Control over respective fabrication processes allowed for tuning of the thickness of the thin film systems with a high degree of precision. It was found that the mechanical indentation of such thin films is significantly affected by the substrate properties; however, elastic parameters were able to be decoupled for constituent thin-film materials (EITO ≈ 96.7 GPa, EHKUST−1 ≈ 22.0 GPa). For indentation of multilayer stacks, it was found that as the layer thicknesses were increased, while holding the relative thickness of ITO and HKUST-1 constant, the resistance to deformation was significantly altered. Such an observation is likely due to small, albeit significant, changes in film texture, interfacial roughness, size effects, and controlling deformation mechanism as a result of increasing material deposition during processing. Such effects may have consequences regarding the rational mechanical design and utilization of MOF-based hybrid thin-film devices.