Monte carlo simulation of planar GaAs nanowire growth

A.A. Spirina,N.L. Shwartz
DOI: https://doi.org/10.1016/j.jcrysgro.2024.127631
IF: 1.8
2024-02-23
Journal of Crystal Growth
Abstract:The Monte Carlo model for the planar GaAs nanowire growth via the vapor–liquid-solid mechanism on GaAs substrate using a gallium droplet as a catalyst is realized. The effect of temperature, Ga and As 2 deposition rates, substrate orientation and surface properties on the morphology of planar GaAs nanowires is considered. It is shown, that at the initial stages of nanowire growth, a 3D GaAs crystal is formed under a gallium droplet, which sets the nanowire growth direction. The range of temperatures and deposition rates of gallium and arsenic, which ensure the planar nanowire formation on the GaAs(1 1 1)A surface, is determined. The investigation of surface properties influence on the nanowire morphology showed that the arsenic diffusion influx into a gallium droplet is of critical importance for the planar GaAs nanowire growth. Ways for achieving a unidirectional growth of planar nanowires on singular and vicinal GaAs surfaces are proposed.
materials science, multidisciplinary,physics, applied,crystallography
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