Influence of diamond wire saw slicing parameters on (010) lattice plane beta-gallium oxide single crystal wafer

Pengcheng Gao,Baimei Tan,Fan Yang,Hui Li,Na Bian,Xiaoqin Sun,Mengrui Liu,Ru Wang
DOI: https://doi.org/10.1016/j.mssp.2021.105939
IF: 4.1
2021-10-01
Materials Science in Semiconductor Processing
Abstract:<p>In this paper, the effect of the process parameters of reciprocating diamond wire saw on the surface quality of the (010) lattice plane β-Ga<sub>2</sub>O<sub>3</sub> single crystal was investigated. According to the theory of the indentation fracture mechanics, a numerical model for the effect of slicing process parameters on the depth of subsurface damage layer of β-Ga<sub>2</sub>O<sub>3</sub> wafer was established, and verified by the slicing experiments of β-Ga<sub>2</sub>O<sub>3</sub> single crystal. The results show that the numerical model can provide reference for strongly anisotropic β-Ga<sub>2</sub>O<sub>3</sub> wafers slicing along different lattice planes. In addition, SEM and SJ-210 roughness measuring instrument were employed to explore the effect of process parameters on the quality of wafer surface after wire saw cutting. According to the theoretical calculation and experimental results, the depth of subsurface damage layer can be reduced and the surface quality of the wafer can be effectively improved by increasing the wire speed or decreasing the feed rate.</p>
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied
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