Abstract:Motivated by recent advancements highlighting Ta as a promising material in low-loss superconducting circuits and showing long coherence times in superconducting qubits, we have explored the effect of cryogenic temperatures on the growth of Ta and its integration in superconducting circuits. Cryogenic growth of Ta using a low temperature molecular beam epitaxy (MBE) system is found to stabilize single phase $\alpha$-Ta on several different substrates, which include Al$\mathrm{_2}$O$\mathrm{_3}$(0001), Si(001), Si(111), SiN${_x}$, and GaAs(001). The substrates are actively cooled down to cryogenic temperatures and remain < 20 K during the Ta deposition. X-ray $\theta$-2$\theta$ diffraction after warming to room temperature indicates the formation of polycrystalline $\alpha$-Ta. The 50 nm $\alpha$-Ta films grown on Al$\mathrm{_2}$O$\mathrm{_3}$(0001) at a substrate manipulator temperature of 7 K have a room temperature resistivity ($\mathrm{\rho _{300 K}}$) of 13.4 $\mathrm{\mu \Omega}$cm, a residual resistivity ratio (RRR) of 17.3 and a superconducting transition temperature (T$_C$) of 4.14 K, which are comparable to bulk values. In addition, atomic force microscopy (AFM) indicates that the film grown at 7 K with an RMS roughness of 0.45 nm was significantly smoother than the one grown at room temperature. Similar properties are found for films grown on other substrates. Results for films grown at higher substrate manipulator temperatures show higher $\mathrm{\rho _{300 K}}$, lower RRR and Tc, and increased $\beta$-Ta content. Coplanar waveguide resonators with a gap width of 3 $\mathrm{\mu}$m fabricated from cryogenically grown Ta on Si(111) and Al$\mathrm{_2}$O$\mathrm{_3}$(0001) show low power Q$_i$ of 1.9 million and 0.7 million, respectively, indicating polycrystalline $\alpha$-Ta films may be promising for superconducting qubit applications even though they are not fully epitaxial.

Low mechanical loss and high refractive index in amorphous films grown by magnetron sputtering

Structure and morphology of low mechanical loss TiO$_2$-doped Ta$_2$O$_5$

Reduction of mechanical losses in ion-beam sputtered tantalum oxide thin films via partial crystallization

Effects of mixing and annealing on the optical and mechanical properties of TiO$_{2}$:Ta$_{2}$O$_{5}$ amorphous coatings

Exploration of co-sputtered Ta$_2$O$_5$-ZrO$_2$ thin films for gravitational-wave detectors

Measurements of Optical Scatter Versus Annealing Temperature for Amorphous Ta2O5 and TiO2:Ta2O5 Thin Films

Amorphous optical coatings of present gravitational-wave interferometers

In-vacuum measurements of optical scatter versus annealing temperature for amorphous Ta2O5 and TiO2:Ta2O5 thin films

Medium range structural order in amorphous tantala spatially resolved with changes to atomic structure by thermal annealing

Optical and mechanical properties of ion-beam-sputtered Nb$_2$O$_5$ and TiO$_2$-Nb$_2$O$_5$ thin films for gravitational-wave interferometers

Mechanical Loss in Tantala/Silica Dielectric Mirror Coatings

Structural evolution of binary oxide nanolaminates with annealing and its impact on room-temperature internal friction

Mechanical loss in state-of-the-art amorphous optical coatings

Study of the crystalline and optical properties of lithium tantalate thin films deposited by high power RF magnetron sputtering

The Microstructure, Morphology, and Mechanical Properties of Sol-Gel-derived Amorphous Aluminum Oxide Films

Cryogenic growth of tantalum thin films for low-loss superconducting circuits

Exceptional Thermal Stability and Properties of Amorphous High-Entropy SiNbTaTiZr Thin Films

Influence of Thermal Annealing on Structural and Optical Properties of RF-sputtered LiTaO3 Thin Films

Growth and Structure of alpha-Ta films for Quantum Circuit Integration

TiO2 doping effect on reflective coating mechanical loss for gravitational wave detection at low temperature

Fabrication of tantalum silicate films with low TCR and low resistivity by magnetron sputtering