Fabrication of DNA-Templated Pt Nanostructures by Area-Selective Atomic Layer Deposition

Liwei Hui,Chen Chen,Min A. Kim,Haitao Liu
DOI: https://doi.org/10.1021/acsami.2c02244
2022-03-31
Abstract:We report the fabrication of DNA-templated Pt nanostructures by area-selective atomic layer deposition. A DNA-templated self-assembled monolayer was used to mediate the area-selective deposition of Pt. Using this approach, we demonstrated the fabrication of both single- and two-component nanostructure patterns, including Pt, TiO2/Pt, and Al2O3/Pt. These nanoscale patterns were used as hard masks for plasma deep etching of Si to fabricate anti-reflection surfaces. This work demonstrated a gas-phase, DNA-templated fabrication of metal nanostructures, which complements earlier work of solution-based DNA metallization. The nanostructures obtained here are useful for applications in nanoelectronics, nanophotonics, and surface engineering.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsami.2c02244.SEM-EDS analysis of DNA-templated Al2O3/Pt patterns at different locations and calculated reflection spectra of Si nanopillars of different shapes (PDF)This article has not yet been cited by other publications.
materials science, multidisciplinary,nanoscience & nanotechnology
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