Modelling the power threshold and optimum thermal deformation of indirectly liquid‐nitrogen cryo‐cooled Si monochromators

Hossein Khosroabadi,Lucia Alianelli,Pablo Sanchez-Navarro,Andrew Peach,Kawal Sawhney
DOI: https://doi.org/10.1107/s1600577524002133
IF: 2.557
2024-04-11
Journal of Synchrotron Radiation
Abstract:A robust theoretical analysis of thermal management of cryo‐cooled Si monochromators in hard X‐ray beamlines is developed. This universal theory has been validated by extensive finite‐element analysis studies, offering guidances to assess the heatload deformation quickly.Maximizing the performance of crystal monochromators is a key aspect in the design of beamline optics for diffraction‐limited synchrotron sources. Temperature and deformation of cryo‐cooled crystals, illuminated by high‐power beams of X‐rays, can be estimated with a purely analytical model. The analysis is based on the thermal properties of cryo‐cooled silicon crystals and the cooling geometry. Deformation amplitudes can be obtained, quickly and reliably. In this article the concept of threshold power conditions is introduced and defined analytically. The contribution of parameters such as liquid‐nitrogen cooling efficiency, thermal contact conductance and interface contact area of the crystal with the cooling base is evaluated. The optimal crystal illumination and the base temperature are inferred, which help minimize the optics deformation. The model has been examined using finite‐element analysis studies performed for several beamlines of the Diamond‐II upgrade.
optics,physics, applied,instruments & instrumentation
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