Study on high-shear and low-pressure grinding using a new BAAT with soft-hard combined substrate for single-crystal silicon

Yebing Tian,Guoyu Zhang,Bing Liu,Shadab Ahmad,Shuang Liu,Shuangchen Zhao
DOI: https://doi.org/10.1007/s00170-024-13141-6
IF: 3.563
2024-02-03
The International Journal of Advanced Manufacturing Technology
Abstract:Single-crystal silicon, a typical hard and brittle material, is widely used in various fields due to its exceptional material properties. However, grinding of silicon is facing great challenges such as surface and subsurface damages due to the hardness and brittleness of the material. To increase the grinding force ratio of tangential to normal force and enhance surface/subsurface quality during silicon grinding, a novel approach employing a newly developed body-armor-like abrasive tool (BAAT) with soft-hard combined substrate has been proposed to achieve high-shear and low-pressure grinding. The grinding principle of this new BAAT with its soft-hard combined substrate was interpreted in comparison to the previous BAAT. The influence of dimension parameters and material properties of the new BAAT on the contact region were analyzed using commercially available software, i.e., Abaqus. The optimal BAAT configuration with a soft-hard combined substrate was determined as elastomer hardness of 50 HA, wheel diameter of 120 mm, and elastomer thickness of 15 mm. Subsequent grinding tests were conducted to assess the performance in terms of surface roughness ( R a ), grinding force, and surface morphology using this newly developed BAAT under various conditions. With the new BAAT, the grinding force ratio, defined as the tangential force to the normal force, was calculated as 0.45. The optimum grinding conditions were identified as a feed rate of 500 mm/min, wheel velocity of 8 m/s, abrasive grain size of 0.5 μm, and abrasive mass fraction of 5%. Under the optimal conditions, the surface roughness ( R a ) of the workpiece decreased from 273.3 to 45.0 nm after 12 strokes with an improvement of 83.5%. It was observed that the deep pits and scratches of the initial workpiece surface were completely removed with relatively uniform grinding textures generated on the ground workpiece surface. The results demonstrated that high-shear and low-pressure grinding using the new BAAT was capable of attaining high-quality grinding for single-crystal silicon.
engineering, manufacturing,automation & control systems
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