Dielectric Thickness Dependence of Carrier Mobility in Graphene with HfO2 Top Dielectric

Babak Fallahazad,Seyoung Kim,Luigi Colombo,Emanuel Tutuc
DOI: https://doi.org/10.48550/arXiv.1010.0913
2010-10-05
Mesoscale and Nanoscale Physics
Abstract:We investigate the carrier mobility in mono- and bi-layer graphene with a top HfO2 dielectric, as a function of the HfO2 film thickness and temperature. The results show that the carrier mobility decreases during the deposition of the first 2-4 nm of top dielectric and remains constant for thicker layers. The carrier mobility shows a relatively weak dependence on temperature indicating that phonon scattering does not play a dominant role in controlling the carrier mobility. The data strongly suggest that fixed charged impurities located in close proximity to the graphene are responsible for the mobility degradation.
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