Coalescence and dislocation of laser induced periodic ripples on silicon by double time delayed femtosecond laser beams

Yuting Bai,Nan Zhang,Zhidan Gao,Jianan Wang,Bing Liu
DOI: https://doi.org/10.1016/j.optlastec.2024.110995
IF: 4.939
2024-04-12
Optics & Laser Technology
Abstract:In this work, double orthogonally polarized femtosecond laser beams with picosecond time delay are employed to irradiate the silicon wafer. The scanning speed of the silicon wafer is 10 mm/s, which is kept constant during the experiment. Taking account of the focal spot size (25 μm) and the laser repetition rate (1 kHz), only 2.5 pulses on average strike on a single spot of the silicon wafer. It is found that periodic ripples with different morphologies are respectively formed in the middle part and periphery of the etching line. These two types of periodic ripples have nearly identical periods, but have a spatial phase difference of π and different morphologies. The spatial phase difference and the different patterns of the ripples infer that ripples' coalescence occurs in the middle part of the etching line, leading to the dislocation of the periodic ripples. It is considered that the recoil pressure due to the material ejection mainly induced by the subsequently incident laser beam plays a critical role in the coalescence and dislocation of the laser induced periodic ripples. It is well known that the period and orientation of the ripples can be controlled respectively by the wavelength and the polarization of femtosecond laser, furthermore this work demonstrates that the spatial phase of the periodic ripples also can be adjusted which may find important applications in fabricating the metasurface optical elements.
optics,physics, applied
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