Application of SPC in High Power Semiconductor Device Production

Zhang Zhi-yong
Abstract:Statistical Process Control(SPC) techniques are introduced to analyze process parameters in order to improve device reliability and yield,control process production and penetrate quality control into critical production process in this paptr.The SPC techniques consist of judgment rule,technique flow,control chart and process capability analysis aredetailed.Taken POCL3 diffusion for example,how SPC techniques work in high power semiconductor device process is shown.It is calculated that process capability index is 1.81,deviation is slight and practical distribution mean value is centered on the target mean value.It is concluded that the process ability is very strong.
Engineering
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