Investigation on influence of polishing disc materials in UV-catalytic polishing of single crystal diamond

Wentao Liu,Jiabin Lu,Qiang Xiong,Xinhan Wang,Qiusheng Yan
DOI: https://doi.org/10.1016/j.diamond.2023.110678
IF: 3.806
2023-12-07
Diamond and Related Materials
Abstract:The effects of three materials (Fe, SiO 2 , Al 2 O 3 ) on the tribological behavior and material removal process of single crystal diamond (SCD) in a UV-catalyzed environment were investigated through ball-on-disc friction and wear experiments, as well as CMP experiments. The results indicate that the material removal rate (MRR) of SCD increases with the hardness of the polishing disc material. However, the surface roughness Ra is influenced by the synergistic effect of both chemical and mechanical actions. Strong chemical action leads to C-O corrosion on the surface, while strong mechanical action causes sp 2 damage to surface C atoms. When using Al 2 O 3 discs, the MRR is the highest, reaching 713.5 nm/h, while SiO 2 discs result in a smooth surface with a surface roughness Ra of 0.26 nm. Therefore, the SCD can be rough polished with Al 2 O 3 discs first and then fine polished with SiO 2 discs to achieve a high material removal rate and superior surface quality simultaneously.
materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
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