Etch induced microwave losses in titanium nitride superconducting resonators

Martin Sandberg,Michael R. Vissers,Jeffrey S. Kline,Martin Weides,Jiansong Gao,David S. Wisbey,David P. Pappas

DOI: https://doi.org/10.1063/1.4729623

IF: 4

2012-06-25

Applied Physics Letters

Abstract:We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on silicon wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers, the reactive etched resonators showed low internal loss, whereas the ion-milled samples showed dramatically higher loss. At single-photon powers, we found that the fluorine-etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re-deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators.

physics, applied